Work

Surface oxidation model in plasma enhanced atomic layer deposition for silicon oxide films including various aminosilane precursors

Year: 2019

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.5078537

Authors: Kosuke Yamamoto, Ayuta Suzuki, Munehito Kagaya, Masaaki Matsukuma, Tsuyoshi Moriya

Institution: Tokyo Electron Technology Solutions Limited (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2914402011

FWCI: 0.271

Cites: 29

Cited by: 7

Related to: 10