Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
Year: 2019
Type: conference-paper
DOI: 10.1117/12.2515503
Authors: Pieter Vanelderen, Victor Blanco, Ming Mao, Yoann Tomczak, David de Roest, Nicola Kissoon, Paulina Rincon Delgadillo, Gijsbert Rispens, Guido Schiffelers, Abhinav Pathak, Frederic Lazzarino, Danilo De Simone, Etienne de Poortere, Moyra McManus, Daniele Piumi, Eric Hendrickx, Geert Vandenberghe
Institutions: IMEC, ASM International (Belgium), ASML (Netherlands)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2921936596