ChemInform Abstract: Tantalum Oxide Thin Films for Dielectric Applications by Low‐Pressure Chemical Vapor Deposition. Physical and Electrical Properties.
Year: 1993
Type: article
Source: ChemInform
Authors: W. R. HITCHENS, W. C. KRUSELL, D. M. DOBKIN
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2952944147