Work

Ternary composites of passivation layer for hole plasma etching of IGZO-TFT

Year: 2019

Type: article

Source: Chinese Journal of Liquid Crystals and Displays

DOI: 10.3788/yjyxs20193406.0564

Authors: 田茂坤 TIAN Mao-kun, 董晓楠 DONG Xiao-nan, 黄中浩 HUANG Zhong-hao, 王骏 WANG Jun, 王思江 WANG Si-jiang, 赵永亮 ZHAO Yong-liang, 闵泰烨 MIN Tai-ye, 袁剑峰 YUAN Jian-feng, 孙耒来 SUN Lei-lai, 谌伟 CHEN Wei, 王恺 WANG Kai, 吴旭 WU Xu

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2966600166

FWCI:

Cites:

Cited by: 1

Related to: 10