Comparison of low damage sputter deposition techniques to enable the application of very thin a-Si passivation films
Year: 2019
Type: conference-paper
Source: AIP conference proceedings
DOI: 10.1063/1.5123836
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2971134824
