Work

Low temperature processed poly-Si thin-film transistors with thinner LPD-SiO2 as gate insulator and its reliability

Year: 1995

Type: article

Authors: CL Fan, CF Yeh, H.K. Tsai, W. Lur, P. W. Yen

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2983481979

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Related to: 10