Work

Advanced Black Resist Processing and Optimized Lithographic Patterning for Novel Photonic Devices

Year: 2019

Type: conference-paper

Source: International Wafer Level Packaging Conference (IWLPC)

DOI: 10.23919/iwlpc.2019.8914139

Authors: B. Matuskova, H. Taguchi, M. Weinhart, R. Holly, M. Brunnbauer, J. Rimbock, T. Zenger, M. Eibelhuber, T. Uhrmann, Y. Taguchi

Institutions: EV Group (Austria), Fujifilm (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2990400380

FWCI:

Cites: 2

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Related to: 10