Work

Pulsed laser annealing for advanced technology nodes: Modeling and calibration

Year: 2019

Type: article

Source: Applied Surface Science

DOI: 10.1016/j.apsusc.2019.144470

Authors: K. Huet, J. Aubin, P.-E. Raynal, B. Curvers, A. Verstraete, B. Lespinasse, F. Mazzamuto, A. Sciuto, S.F. Lombardo, A. La Magna, P. Acosta-Alba, L. Dagault, C. Licitra, J.-M. Hartmann, S. Kerdilès

Institutions: Laser Systems & Solutions of Europe (France), University of Catania, Institute for Microelectronics and Microsystems, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire d'Électronique des Technologies de l'Information, Université Grenoble Alpes, Centre National de la Recherche Scientifique, Université Toulouse III - Paul Sabatier, Laboratoire d'Analyse et d'Architecture des Systèmes, Université de Toulouse

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2990872503

FWCI: 1.654

Cites: 19

Cited by: 56

Related to: 10