The two-stage electrochemical deposition of a manganese-doped silicon-carbon film onto the silicon (100) substrate
Year: 2019
Type: conference-paper
Abstract: Manganese-doped silicon-carbon films with a thickness about 100 nm were deposited on a silicon substrate by using the electrochemical route from the methanol, hexamethyldisilazane and manganese sulfate (CH3OH, (CH3)3-Si-NH-Si-(CH3)3 (HMDSN), MnSO4·5H2O) solution. At the first stage, the current density decreased from 51 mA/cm2 to less than 37 mA/cm2 with increasing the deposition time and slightly increased at the second stage when manganese sulfate was added. The analysis derived from the X-ray diffraction pattern indicates that Mn atoms interact with Si atoms and form mainly Mn5Si2 and Mn22,6Si5,4C4 phases.
Authors: T S Mikhailova, M N Grigoryev, T N Myasoedova
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W2995065636