Work

Fabrication and characterization of a single monolayer NiSi 2 sandwiched between a Tl capping layer and a Si(1 1 1) substrate

Year: 2019

Type: article

Source: 2D Materials

DOI: 10.1088/2053-1583/ab6495

Authors: L V Bondarenko, A Y Tupchaya, A N Mihalyuk, S V Eremeev, A V Matetskiy, N V Denisov, Y E Vekovshinin, A V Slyshkin, D V Gruznev, A V Zotov, A A Saranin

Institutions: Institute of Automation and Control Processes, Far Eastern Branch of the Russian Academy of Sciences, Far Eastern Federal University, Institute of Strength Physics and Materials Science, National Research Tomsk State University

Language: English

Topic: Surface and Thin Film Phenomena

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funder: Russian Science Foundation

Award: G6090110146

OpenAlex ID: W2995257960

FWCI: 0.894

Cites: 49

Cited by: 11

Related to: 10