Effect of concentration change of 0.1% triton added 25 wt% TMAH during fabrication of deep cavities with mesa structures in SOI wafer
Year: 2020
Type: article
Source: Microelectronic Engineering
Authors: P. Krishna Menon, Akarapu Ashok, A.V. Narasimha Rao, Ashok Kumar Pandey, Prem Pal
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W3016299397