Modeling UV-C irradiation chambers for mask decontamination using Zemax OpticStudio
Year: 2020
Type: article
Source: Applied Optics
DOI: 10.1364/ao.402603
Institution: Stanford University
Language: English
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W3045007722
