Work

Wafer-scale low-loss lithium niobate photonic integrated circuits

Year: 2020

Type: article

Abstract: Thin-film lithium niobate (LN) photonic integrated circuits (PICs) could enable ultrahigh performance in electro-optic and nonlinear optical devices. To date, realizations have been limited to chip-scale proof-of-concepts. Here we demonstrate monolithic LN PICs fabricated on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching, achieving 0.27 dB/cm optical propagation loss on wafer-scale. Our results show that LN PICs are fundamentally scalable and can be highly cost-effective.

Source: Optics Express

DOI: 10.1364/oe.401959

Authors: Kevin Luke, Prashanta Kharel, Christian Reimer, Lingyan He, Marko Loncar, Mian Zhang

Institution: Harvard University

Language: English

Topic: Photorefractive and Nonlinear Optics

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funders: National Science Foundation, Harvard University