Work

Order-disorder behavior at thin film oxide interfaces

Year: 2020

Type: review

Source: Current Opinion in Solid State and Materials Science

DOI: 10.1016/j.cossms.2020.100870

Author: Steven R. Spurgeon

Institution: Pacific Northwest National Laboratory

Language: English

Topic: Electronic and Structural Properties of Oxides

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W3045669162

FWCI: 0.042

Cites: 94

Cited by: 8

Related to: