Work

Green chemical mechanical polishing of sapphire wafers using a novel slurry

Year: 2020

Type: article

Source: Nanoscale

DOI: 10.1039/d0nr04705h

Authors: Wenxiang Xie, Zhenyu Zhang, Longxing Liao, Jie Liu, Hongjiu Su, Shudong Wang, Dongming Guo

Institutions: Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian University of Technology, Dalian National Laboratory for Clean Energy

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Industrial and Manufacturing Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

Funders: Dalian University of Technology, Collaborative Innovation Center of Major Machine Manufacturing in Liaoning, Changjiang Scholar Program of Chinese Ministry of Education, National Key Research and Development Program of China

Award: G8979467305

OpenAlex ID: W3086529909

FWCI: 14.46

Cites: 46

Cited by: 205

Related to: 10