Work

Spectroscopy: a new route towards critical-dimension metrology of the cavity etch of nanosheet transistors

Year: 2021

Type: conference-paper

Source: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

DOI: 10.1117/12.2581800

Authors: Janusz Bogdanowicz, Yusuke Oniki, Karine Kenis, Yusuke Muraki, Thomas Nuytten, Stefanie Sergeant, Alexis Franquet, Valentina Spampinato, Thierry Conard, Ilse Hoflijk, Johan Meersschaut, Niels Claessens, Alain Moussa, Dieter Van den Heuvel, Joey Hung, Roy Koret, Anne-Laure Charley, Philippe Leray

Institutions: IMEC, Tokyo Electron (Japan), KU Leuven, Nova Measuring Instruments (Israel)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3131004316

FWCI: 1.548

Cites:

Cited by: 6

Related to: 10