Work

Imaging-based overlay metrology optimized by HV-SEM in 3D-NAND process

Year: 2021

Type: conference-paper

Source: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

DOI: 10.1117/12.2583609

Authors: Yu-Lin Liu, Li-Ting Chang, Chi-Hao Huang, Mars Yang, Elvis Yang, T. H. Yang, K. C. Chen

Institution: Macronix International (Taiwan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3131609342

FWCI: 0.774

Cites:

Cited by: 3

Related to: 10