Work

Novel diffraction based overlay metrology utilizing phase-based overlay for improved robustness

Year: 2021

Type: conference-paper

Source: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

DOI: 10.1117/12.2584759

Authors: Masazumi Matsunobu, Toshiharu Nishiyama, michio Inoue, Richard Housley, Cornel Bozdog, Justin Lim, Brian Watson, Jason Reece, Steve McCandless, Olger Zwier, Maurits van der Schaar, Murat Bozkurt, Masudur al Arif, Elliott McNamara, Pieter Kapel, Alan Khan, Simon Strom, Paul Turner, Ping Olson, Ewoud van West

Institutions: Micron Memory Japan, K.K. (Japan), Micron (United States), ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3132279146

FWCI: 1.934

Cites:

Cited by: 8

Related to: 10