Work

A study on various curvilinear data representations and their impact on mask manufacturing flow

Year: 2021

Type: conference-paper

Source: SPIE Optical Microlithography

DOI: 10.1117/12.2588374

Authors: Sayalee Gharat, Bhardwaj Durvasula, Ravi Pai, Peter Buck, Sandeep Koranne, Alexander Tritchkov

Institution: Siemens (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3132475475

FWCI: 2.321

Cites:

Cited by: 8

Related to: 10