Work

Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure

Year: 2021

Type: conference-paper

Source: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

DOI: 10.1117/12.2583714

Authors: Sayantan Das, Joey Hung, Sandip Halder, Roy Koret, Igor Turovets, Anne-Laure Charley, Philippe Leray

Institutions: IMEC, Nova Measuring Instruments (Israel)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W3133220188

FWCI: 0.774

Cites:

Cited by: 2

Related to: 10