Work

Analysis of two alternative scaling strategies for sub-30 nm Double-Gate SOI MOSFETs

Year: 2006

Type: conference-paper

Source: Archivio istituzionale della ricerca (Alma Mater Studiorum Università di Bologna)

Authors: N. Barin, M. Braccioli, C. Fiegna, E. Sangiorgi

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3136399682

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