Work

Heat sink implementation in back-end of line for self-heating reduction in 22 nm FDSOI MOSFETs

Year: 2021

Type: article

Source: Solid-State Electronics

DOI: 10.1016/j.sse.2021.108088

Authors: Arka Halder, Lucas Nyssens, Martin Rack, Dimitri Lederer, Jean-Pierre Raskin, Valeriya Kilchytska

Institution: UCLouvain

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: Innoviris, Electronic Components and Systems for European Leadership

OpenAlex ID: W3172323958

FWCI: 0.294

Cites: 18

Cited by: 7

Related to: 10