Work

Direct-simulation Monte Carlo modeling of reactor-scale gas-dynamic phenomena in a multiwafer atomic-layer deposition batch reactor

Year: 2021

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0000993

Authors: Sudharshanaraj Thiruppathiraj, Seung-Min Ryu, Jiho Uh, Laxminarayan L. Raja

Institutions: Samsung (South Korea), Samsung Electronics (South Korea), The University of Texas at Austin

Language: English

Topic: Gas Dynamics and Kinetic Theory

Subfield: Applied Mathematics

Field: Mathematics

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3191349600

FWCI: 0.627

Cites: 30

Cited by: 9

Related to: 10