Work

Study on the influence of ion incident energy on surface charging in plasma etching

Year: 2021

Type: article

Source: Physica Scripta

DOI: 10.1088/1402-4896/ac233e

Author: Peng Zhang

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3197998317

FWCI: 0.073

Cites: 30

Cited by: 2

Related to: 10