Work

File formats for curvilinear multi-beam writing of 193i and EUV masks

Year: 2021

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.2602375

Authors: Christof Zillner, Amir Moqanaki, Harald Höller, Elmar Platzgummer, Masakazu Hamaji, Taigo Fujii

Institution: IMS Nanofabrication (Austria)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3203210116

FWCI: 1.927

Cites: 5

Cited by: 6

Related to: 10