Work

New metrology technique for measuring wafer geometry on a full 300mm silicon wafer

Year: 2021

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.2605516

Authors: Juan M. Trujillo-Sevilla, Oscar Casanova-González, Miriam Velasco-Ocaña, Sabato Ceruso, Ricardo Oliva-García, Óscar Gómez-Cárdenes, Javier Martín-Hernández, Alex Roqué-Velasco, Álvaro Pérez-García, José Manuel Ramos, Jan O. Gaudestad

Language: English

Topic: Optical measurement and interference techniques

Subfield: Computer Vision and Pattern Recognition

Field: Computer Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3204723757

FWCI: 0.462

Cites: 6

Cited by: 7

Related to: 10