Work

Effect of annealing and oxygen partial pressure on the RF sputtered WO3 thin films for electrochromic applications

Year: 2021

Type: article

Source: Materials Today Proceedings

DOI: 10.1016/j.matpr.2021.11.185

Authors: K Naveen Kumar, Habibuddin Shaik, Amulya Pawar, L.N. Chandrashekar, Sheik Abdul Sattar, G. Nithya, R. Imran Jafri, V. Madhavi, Jyothi Gupta, G.V. Ashok Reddy

Institutions: Nitte Meenakshi Institute of Technology, Christ University, Indian Institute of Science Bangalore

Language: English

Topic: Transition Metal Oxide Nanomaterials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: All India Council for Technical Education

OpenAlex ID: W3216619366

FWCI: 1.44

Cites: 28

Cited by: 26

Related to: 10