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From pulsed power to processing : plasma initiated chemical process intensification

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Year: 2012
Type: article
Source: TU/e Research Portal
Authors: van Ejm Bert Heesch, K. Yan, Ajm Guus Pemen, Gjj Hans Winands, Fjcm Frank Beckers, Wflm Wilfred Hoeben
Institution: Eindhoven University of Technology
Language: English

Topic: Atmospheric-Pressure Plasma Applications
Subfield: Atomic and Molecular Physics, and Optics
Field: Physics and Astronomy
Domain: Physical Sciences
SDGs: Industry, innovation and infrastructure, Affordable and clean energy

Open Access status: closed

Funders: Dystonia Medical Research Foundation, Rijksuniversiteit Groningen, ZonMw, Fonds Psychische Gezondheid, China Scholarship Council, AOP Orphan
OpenAlex ID: W33011198
FWCI: 0.305
Cites: 14
Cited by: 3
Related to: 10
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