Work

Chemical vapor deposition of gold on Al2O3, SiO2, and TiO2 for the oxidation of CO and of H2

Year: 1998

Type: article

Source: Catalysis Letters

DOI: 10.1023/a:1019020614336

Authors: Mitsutaka Okumura, Shyunichi Nakamura, Susumu Tsubota, Toshiko Nakamura, Masashi Azuma, Masatake Haruta

Institutions: National Institute of Advanced Industrial Science and Technology, Osaka Institute of Technology

Language: English

Topic: Catalytic Processes in Materials Science

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W394339504

FWCI: 8.23

Cites: 19

Cited by: 496

Related to: 10