Work

Image quality compensation via tolerance sensitivity matrix method in lithography

Year: 2021

Type: conference-paper

Source: International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT)

DOI: 10.1117/12.2626166

Authors: Chao Yang, Xianchang Zhu, Jing Chuan, Xiaolong Cheng, Haifeng Sun, Song Hu

Institutions: Institute of Optics and Electronics, Chinese Academy of Sciences, University of Chinese Academy of Sciences

Language: English

Topic: Advanced optical system design

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4200319617

FWCI:

Cites: 2

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Related to: 10