Work

Source optimization for forbidden pitch resolving in metal layer of 5nm technology node

Year: 2022

Type: conference-paper

Source: DTCO and Computational Patterning

DOI: 10.1117/12.2614008

Authors: Ling Ma, Lisong Dong, Taian Fan, Yayi Wei

Institutions: Institute of Microelectronics, University of Chinese Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4224257614

FWCI:

Cites:

Cited by:

Related to: 10