Deposition of nanostructured metals on the surface of silicon by galvanic replacement: a mini-review
Year: 2019
Type: review
Abstract: The paper overviews the publications of the last decade devoted to the formation of metallic nanostructures on the surface of the silicon substrate by the galvanic replacement method.Among modern methods of surface modification by nanostructures, galvanic replacement can be considered as one of the most effective in the aspect of obtaining new materials and applying metal films.The deposits of silicon nanostructures of silver, gold, platinum metals and copper are the most studied.The features of microelectrode reactions with the participation of the semiconductor and the components of the solution are discussed.The methods of metal nanoparticles and nanofilms deposition on the silicon wafer surface are reviewed.The data on the influence of the main parameters of the galvanic replacement process (composition of the solution, duration of precipitation and temperature) on the deposits' morphology and the geometry of the deposited particles are presented.The main directions in the application of metal-silicon hybrid structures obtained by galvanic replacement, namely metal-catalytic chemical etching, creation of electrical contacts on the surface of silicon and high-performance catalysts and sensors, are described.It has been shown that the galvanic replacement method provides controlled synthesis of metal nanoparticles of defined morphology, shape, size and distribution on the surface of silicon substrate and their special functional properties.
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W4239113222