Work

Effect of Oxygen on the Electrical and Structural Properties of Triode-Sputtered Tantalum Films

Year: 1971

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.1659995

Authors: Neil Waterhouse, Philip S. Wilcox, David J. Willmott

Institution: Bell (Canada)

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4240956540

FWCI: 9.993

Cites: 15

Cited by: 20

Related to: 10