Work

Deposition of Highly Crystallized Poly-Si Thin Films on Polymer Substrates Using Pulsed-Plasma CVD under Near-Atmospheric Pressure

Year: 2006

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2006-02/33/1588

Authors: Mitsutaka matsumoto, Maki Suemitsu, Takuya Yara, Nakajima Setsuo, Uehara Tuyoshi, Toyoshima Yasutake

Institutions: Tohoku University, Sekisui Chemical (Japan), National Institute of Advanced Industrial Science and Technology

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4247966596

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