Work

High-transmission EUV pellicles supporting >400W source power

Year: 2022

Type: conference-paper

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2614262

Authors: Mark A. van de Kerkhof, Alexander Klein, Paul Vermeulen, Ties van der Woord, Inci Donmez, Guido Salmaso, Raymond Maas

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4282007307

FWCI: 5.099

Cites:

Cited by: 20

Related to: 10