Work

Copper halide anion engineering for p-channel electrolyte-gated transistors with superior operational reliability

Year: 2022

Type: article

Source: Journal of Materials Chemistry C

DOI: 10.1039/d2tc02062a

Authors: Da In Lee, Min Su Kim, Kyung Gook Cho, Kihyon Hong, Keun Hyung Lee

Institutions: Inha University, Chungnam National University

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Korea Institute for Advancement of Technology, Korea Basic Science Institute, National Research Foundation of Korea

Awards: G2713974173, G3690903020, G622277567, G6397576861, G7514118397

OpenAlex ID: W4290805086

FWCI: 0.136

Cites: 55

Cited by: 2

Related to: 10