Work

Measuring IVDF through high−aspect holes in pulsed ICP plasmas

Year: 2015

Type: conference-paper

Source: HAL

Authors: Cunge., G., Darnon., M., Dubois., J, Bezard., P, Mourey., O, Petit−etienne., C, Vallier., L, Despiau−pujo., E, Joubert., O, Sadeghi ., N

Institution: Laboratoire des Technologies de la Microélectronique

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4290821773

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