Automated Computer Vision-Enabled Manufacturing of Nanowire Devices
Year: 2022
Type: article
Abstract: We present a high-throughput method for identifying and characterizing individual nanowires and for automatically designing electrode patterns with high alignment accuracy. Central to our method is an optimized machine-readable, lithographically processable, and multi-scale fiducial marker system─dubbed LithoTag─which provides nanostructure position determination at the nanometer scale. A grid of uniquely defined LithoTag markers patterned across a substrate enables image alignment and mapping in 100% of a set of >9000 scanning electron microscopy (SEM) images (>7 gigapixels). Combining this automated SEM imaging with a computer vision algorithm yields location and property data for individual nanowires. Starting with a random arrangement of individual InAs nanowires with diameters of 30 ± 5 nm on a single chip, we automatically design and fabricate >200 single-nanowire devices. For >75% of devices, the positioning accuracy of the fabricated electrodes is within 2 pixels of the original microscopy image resolution. The presented LithoTag method enables automation of nanodevice processing and is agnostic to microscopy modality and nanostructure type. Such high-throughput experimental methodology coupled with data-extensive science can help overcome the characterization bottleneck and improve the yield of nanodevice fabrication, driving the development and applications of nanostructured materials.
Source: ACS Nano
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $5,000
Awards: Holographic beam shaping of high power lasers for additive manufacturing, G1668778022, G1956106542, Versatile Quantum Multiplexing, G2548936362, G271449127, G2765683020, Multiplexed Quantum Integrated Circuits, G3613681821, Integration of Novel Materials in Spintronic Devices, G4595860746, G5085048528, G5516811719, EPSRC Centre for Doctoral Training in Ultra Precision, G7044344860, G717069853, Beyond direct-write: Dynamically reconfigurable holographic multibeam interference lithography for high-throughput nanomanufacturing, G8342509210, A Cross-Correlated Approach to Engineering Nitride Nanowires, G8818906431
OpenAlex ID: W4297093465