Work

A study of patterning 36nm-pitch logic contact holes in a metal oxide resist using a high-reflectance phase-shifting mask that results in image reversal

Year: 2022

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.2642302

Authors: Shih En Tseng, Chun-Kuang Chen, Dong-Seok Nam, Will Lin, Anthony Yen

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4308697338

FWCI: 1.166

Cites: 14

Cited by: 4

Related to: 10