Work

The trade-off between local critical dimension uniformity and sensitivity for contact hole high-NA printing in chemically amplified resists

Year: 2022

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.2641648

Authors: Chawon Koh, Jinkyu Han, Jinmo Kim, Cheolhong Park, Eunju Kim, Tsunehiro Nishi, Christopher N. Anderson, Patrick Naulleau

Institutions: Samsung Electronics (South Korea), Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4308698658

FWCI:

Cites: 3

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Related to: 10