Work

Novel photosensitive resin simultaneously with outstanding cryogenic strength and toughness for digital light processing three-dimensional Printing

Year: 2022

Type: article

Source: Materials Today Chemistry

DOI: 10.1016/j.mtchem.2022.101301

Authors: X. Sun, S. Chen, B. Qu, Y. Zheng, X. Liu, W. Li, R. Wang, Q. Chen, D. Zhuo

Institutions: Fujian Normal University, Quanzhou Normal University

Language: English

Topic: Photopolymerization techniques and applications

Subfield: Organic Chemistry

Field: Chemistry

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4311069457

FWCI: 0.537

Cites: 57

Cited by: 9

Related to: 10