Work

Optimization of uniformity in plasma ashing process using genetic programming

Year: 2023

Type: article

Source: Journal of Physics D Applied Physics

DOI: 10.1088/1361-6463/acce4a

Authors: Tsuyoshi Moriya, Yusuke Suzuki, Hitoshi Yonemichi, Hironori Moki

Institutions: Tokyo Electron (Japan), Tokyo Electron Technology Solutions Limited (Japan)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4366365478

FWCI: 0.071

Cites: 15

Cited by: 1

Related to: 10