Work

Computational lithography solutions to support EUV high-NA patterning

Year: 2023

Type: conference-paper

Source: DTCO and Computational Patterning

DOI: 10.1117/12.2660858

Authors: Rongkuo Zhao, Fan Zhou, Jialei Tang, Jeff Lu, Yunbo Liu, Dezheng Sun, Ming-Chun Tien, Stephen Hsu, Rachit Gupta, Youping Zhang, Joerg Zimmermann

Institution: ASML (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4367307882

FWCI: 3.163

Cites:

Cited by: 7

Related to: 10