Patterning assessment using 0.33NA EUV single mask for next generation DRAM manufacturing
Year: 2023
Type: conference-paper
DOI: 10.1117/12.2660763
Authors: Jeonghoon Lee, Sandip Halder, Van Tuong Pham, Roberto Fallica, Seonggil Heo, Kaushik Sah, Hyo Seon Suh, Victor Blanco, Werner Gillijns, Andrew Cross, Ethan Maguire, Ana-Maria Armeanu, Vladislav Liubich, Evgeny Malankin, Xima Zhang, Monica Kempsell Sears, Neal Lafferty, Germain Fenger, Chih-I Wei, Ryoung Han Kim
Institutions: IMEC, Siemens (France), Siemens (Belgium)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4367307989