Work

EUV single patterning validation of curvilinear routing

Year: 2023

Type: conference-paper

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2654633

Authors: Fergo Treska, Dongbo Xu, Yasser Sherazi, Werner Gillijns

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4367307999

FWCI: 1.914

Cites:

Cited by: 4

Related to: 10