Work

Mask roughness contribution to wafer edge placement error

Year: 2023

Type: conference-paper

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2658332

Authors: Andreas Frommhold, Joern-Holger Franke, Tatiana Kovalevich, Eelco van Setten, Vidya Vaenkatesan

Institutions: IMEC, ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4367308378

FWCI: 1.356

Cites:

Cited by: 3

Related to: 10