Work

The potential of e-beam lithography for micro- and nano-optics on large areas

Year: 2023

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.2658440

Authors: Uwe D. Zeitner, Michael Banasch, Marcus Trost

Institutions: Fraunhofer Institute for Applied Optics and Precision Engineering, Vistec Electron Beam (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4367548841

FWCI: 0.904

Cites:

Cited by: 2

Related to: 10