Work

Coater/developer-based techniques to achieve tight pitches towards high-NA EUV

Year: 2023

Type: conference-abstract

Source: Advances in Patterning Materials and Processes

DOI: 10.1117/12.2657290

Authors: Kanzo Kato, Lior Huli, Nathan Antonovich, David Hetzer, Steven Grzeskowiak, Eric Liu, Akiteru Ko, Satoru Shimura, Shinichiro Kawakami, Takahiro Kitano, Seiji Nagahara, Luciana Meli, Indira Seshadri, Martin Burkhardt, Karen Petrillo

Institutions: Tokyo Electron Kyushu Ltd (Japan), Tokyo Electron (Japan), IBM (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4367603256

Cites:

Cited by: 5

Related to: 10