Work

The more you avoid, the worse you will get: a cross-lagged panel model of shyness, mobile phone dependence and depression

Year: 2023

Type: article

Study design: Observational Study

Source: Journal of Mental Health

DOI: 10.1080/09638237.2023.2210665

Authors: Min Jiang, Wan Ding, Xiaoyue Wang, Zhaoxing Sun, Weijian Li, Ruibo Xie, Thi Phuong Nguyen

Institutions: Zhejiang Normal University, Beijing Normal University

Language: English

Topic: Impact of Technology on Adolescents

Subfield: Sociology and Political Science

Field: Social Sciences

Domain: Social Sciences

SDG: Good health and well-being

Open Access status: closed

Funder: National Social Science Fund of China

OpenAlex ID: W4376872085

FWCI: 4.893

Cites: 55

Cited by: 17

Related to: 10