Work

Improvement of LDP EUV source performance for actinic patterned mask inspection

Year: 2023

Type: conference-abstract

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2671128

Authors: Safak Sayan, Kishore K. Chakravorty, Yusuke Teramoto, Bárbara Santos, Akihisa Nagano, Noritaka Ashizawa, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Kazuya Aoki, Yoshihiko Sato

Institutions: Intel (United States), Ushio (Germany), Ushio (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4378363166

Cites:

Cited by: 1

Related to: 10